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Material Solutions Center, Tohoku University(MaSC)

Shared equipment

Shared equipment

Shared equipment

Multipurpose X-ray Diffraction System

Multipurpose X-ray Diffraction System
SmartLab3G

Equipment Overview (Purpose)

Structural analyses of thin film samples, powder samples, and bulk samples

Main Features and Applications

【Features】　

  • Easy to switch between focused and collimated beam optics
  • SmartLab Guidance offers support for setting and executing measurement conditions

【Applications】

  • Qualitative analysis
  • Thin film evaluation
  • Crystallinity evaluation
  • Orientation evaluation
  • Quantitative analysis
  • Particle size evaluation
  • Stress evaluation

Main Specifications

X-ray generator
X-ray generator 3kV
Rated voltage 20～45kV
Rated current 2～60mA
Method Enclosed tube type
Target Cu
Focus size 0.4×8mm
(Line/point focus)
Optical unit
Incident optical system CBO, automatic-width-control incident slit
Light-receiving optical system automatic-width-control scattering slit, automatic-width-control light-receiving slit
Rated current 2～60mA
Goniometer unit
Scan mode θs/θd linked,θs,θd solitary
Continuous feedback control
Goniometer radius 300nm
Minimum step angle 0.0001°
Enclosed tube 3-axis sample table χ：-5～＋95°　Φ：0～360°　
Z：4～＋1mm
Sample size Standard Φ100mm×3mm thickness
Detection unit
Detector Scintillation counter
D/Tex　Ultra250

Available Optional Features & Option Purpose

Available Optional Features Option Purpose
Available Optional Features：Detector（D/Tex　Ultra250） Option Purpose：High-speed, high-sensitivity resolution measurements

Equipment Photo

Click on the photo to enlarge.

  • 多機能走査型X線光電子分光分析装置（XPS)

    Overall view of the equipment

  • 多機能走査型X線光電子分光分析装置（XPS)

    Main body of Multipurpose X-ray Diffraction System equipment

  • 多機能走査型X線光電子分光分析装置（XPS)

    X-ray diffraction system in the device

2013 © Material Solutions Center, Tohoku University. All rights.

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