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NIR Spectrometer

Shared equipment

NIR Spectrometer

NIR Spectrometer
NX-FLIM-TO3

Equipment Overview (Purpose)

This equipment is used for conducting the non-destructive, contactless evaluation of the composition of compound semiconductors. It is used to evaluate defects, quantum wells, and impurities. It is also used to measure luminescence to evaluate crystallinity.

Main Features and Applications

【Features】

Equipped with a microscope to enable the measurement of small areas
Equipped with a streak camera for time-resolved luminescence measurement (1000-1650nm), as well as an excitation laser (635nm) for emission spectroscopy. The equipment extends the lifetime of time-fluorescence measurement using the streak camera and can also be used for measuring refrigerated samples.

【Applications】

Evaluation of composition, defects, impurities, and quantum wells in compound semiconductors
Evaluation of CIGS solar cell materials
Fluorescence lifetime measurement in near-infrared regions

Main Specifications

Microscope
Type	Upright Microscope
Objective Lens	20×（NA0.4/WD20mm）
Creek Camera
Wavelength Sensitivity Range	1000～1650nm
Photocathode	InP/InGaAs
Photocathode Cooling Temperature	-80℃
Minimum Time Resolution	20ps
Time Coefficient	1ns～10ms＠（Full screen）
Microscopy Cryostat
Method	Liquid He-Free
Minimum End-Point Temperature	≦10K

Goniometer unit
Irradiation Current Stability	±0.3　%h
Secondary Electron Resolution	3nm（W.D. 11mm、30kV）
Spectrometer
Focal Distance	30ｃｍ
Simultaneous Measurement Wavelength Range	≧400nm
Excitation Laser
Wavelength	635nm
Pulse Width	≺50ps
Repetition Frequency	40MHz

Equipment Photo

Click on the photo to enlarge.

Overall view of the equipment