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Material Solutions Center, Tohoku University(MaSC)

Shared equipment

Shared equipment

Shared equipment

NIR Spectrometer

NIR Spectrometer
NX-FLIM-TO3

Equipment Overview (Purpose)

This equipment is used for conducting the non-destructive, contactless evaluation of the composition of compound semiconductors. It is used to evaluate defects, quantum wells, and impurities. It is also used to measure luminescence to evaluate crystallinity.

Main Features and Applications

【Features】

  • Equipped with a microscope to enable the measurement of small areas
  • Equipped with a streak camera for time-resolved luminescence measurement (1000-1650nm), as well as an excitation laser (635nm) for emission spectroscopy. The equipment extends the lifetime of time-fluorescence measurement using the streak camera and can also be used for measuring refrigerated samples.

【Applications】

  • Evaluation of composition, defects, impurities, and quantum wells in compound semiconductors
  • Evaluation of CIGS solar cell materials
  • Fluorescence lifetime measurement in near-infrared regions

Main Specifications

Microscope
Type Upright Microscope
Objective Lens 20×(NA0.4/WD20mm)
Creek Camera
Wavelength Sensitivity Range 1000~1650nm
Photocathode InP/InGaAs
Photocathode Cooling Temperature -80℃
Minimum Time Resolution 20ps
Time Coefficient 1ns~10ms@(Full screen)
Microscopy Cryostat
Method Liquid He-Free
Minimum End-Point Temperature ≦10K
Goniometer unit
Irradiation Current Stability ±0.3 %h
Secondary Electron Resolution 3nm(W.D. 11mm、30kV)
Spectrometer
Focal Distance 30cm
Simultaneous Measurement Wavelength Range ≧400nm
Excitation Laser
Wavelength 635nm
Pulse Width ≺50ps
Repetition Frequency 40MHz

Equipment Photo

Click on the photo to enlarge.

  • 顕微可視赤外分光システム

    Overall view of the equipment

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