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- Scanning Electron Microscope System
Shared equipment
Shared equipment
Scanning Electron Microscope System
Scanning Electron Microscope System
JSM-7800F
Equipment Overview (Purpose)
The sample surface is scanned with a narrowly focused electron beam, and the signals generated from the sample (secondary electrons, reflected electrons, and X-rays) are used to obtain information on the sample surface shape, elemental distribution, and crystal orientation.
Main Features and Applications
【Features】
- The super hybrid lens irradiation system enables high resolution observation, low acceleration observation, and observation of magnetic materials.
- Using a field emission electron gun and an opening angle control lens, a large current can be irradiated with a small electron beam diameter, enabling timely EDS and EBSD analyses.
- A cross-section polisher can be installed in the same area for processing of observation samples.
【Applications】
- Imaging of surface topography (e.g., vapor deposit-free, high-resolution observation of insulation samples, observation of the top surface of samples at low acceleration voltages)
- Imaging of elemental distribution
- Imaging of crystal orientation distribution
- Observation without exposure to atmospheric conditions (e.g., alkali metals, lithium-ion batteries, highly reactive samples with hygroscopicity)
Main Specifications
| Resolution | 0.8nm(15kV), 1.2nm(1kV), 3.0nm(15kV, WD10nm, 5nA) |
|---|---|
| Types of Images | Secondary electron image, reflection electron image |
| Acceleration Voltage | 0.01ｋV～30kV |
| Sample reflection current | PA～500ｎA |
| Sample reflection current | ×10～1,000,000 |
| Electron gun | Electron gun In-lens Schottky field emission type Tilt angle |
| Opening Angle Control Lens | Built-in |
| Objective Lenses | Super Hybrid Lens |
| Objective Aperture | 4 steps, X, Y fine adjustment function |
| Automatic Functions | Focus, fault correction, brightness, contrast |
| Recipe Program | Standard observation conditions, user observation conditions |
|---|---|
| Sample Stage | Eucentric method |
| X | 70mm |
| Y | 50mm |
| WD(Z) | 2mm～40㎜ |
| Magnification | ‘-5～＋70° |
| Rotation angle | 360° |
| Number of motor drive axes | axes |
| Dimensions of Sample Holder | 12.5 mm dia. x 10 mm H, 32 mm dia. x 20 mm H |
| Sample Exchange | Sample exchange chamber type 2 (100mm dia. x 40mm H) |
Available Optional Features & Option Purpose
| Available Optional Features | Option Purpose |
|---|---|
| Available Optional Features：Energy Dispersive X-ray Spectrometer (EDS) | Option Purpose：Elemental distribution imaging |
| Available Optional Features：Crystal Orientation Analyzer (EBSD) | Option Purpose：Crystal orientation analysis |
| Available Optional Features：Reflected electron detector (BED) | Option Purpose：Simple elemental distribution imaging, grain observation |
| Available Optional Features：Upward secondary electron detector（USD) | Option Purpose：Secondary electron imaging with high resolution observation |
| Available Optional Features：Upward reflected electron detector | Option Purpose：Reflection electron imaging in high-resolution observation |
| Available Optional Features：Stage Navigation System (SNS) | Option Purpose：Displays position information of observation locations |
Equipment Photo
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Overall view of the equipment
Atmospheric non-exposure equipment
